| 000 | 00920pam a2200253 a 4500 | ||
|---|---|---|---|
| 001 | 0000046837 | ||
| 003 | 0001 | ||
| 008 | 971028s1998 nyua b 001 0 eng | ||
| 020 | _a019856287X | ||
| 035 | _9(DLC) 97039210 | ||
| 040 |
_aDLC _cDLC _dDLC |
||
| 082 | 0 | 0 |
_a621.381531 _221 |
| 084 |
_a621.381531 _bSUG-P |
||
| 100 | 1 |
_aSugawara, M. _q(Minoru) |
|
| 245 | 1 | 0 |
_aPlasma etching _h[Book] : _bfundamentals and applications / _cM. Sugawara ; with contributions from Barry L. Stonsfield ... [et al.]. |
| 260 |
_aNew York : _bOxford University Press, _c1998. |
||
| 300 |
_aviii, 347 p. : _bill. (some col.) ; _c24 cm. |
||
| 440 | 0 |
_aSeries on semiconductor science and technology ; _v7 |
|
| 521 | _aAll. | ||
| 650 | 0 |
_aSemiconductors _xEtching. |
|
| 650 | 0 | _aPlasma etching. | |
| 700 | 1 | _aStansfield, Barry L. | |
| 852 |
_p24766 _90.00 _dBooks |
||
| 999 |
_c156212 _d156212 |
||