Dammel, Ralph,  1954- <br/><br/>
Diazonaphthoquinone-based resists  [Book] / 
Ralph Dammel. 
 - Bellingham, Wash., USA :  SPIE Optical Engineering Press,  c1993. 
 - 203 p. :  ill. ;  26 cm. 
 - Tutorial texts in optical engineering ;  v. TT 11 .
<br/><br/> All. 
<br/><br/><label>ISBN: </label>0819410195 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Photoresists.<br/>Masks (Electronics).
<br/><br/><label>Dewey Class. No.: </label>621.381531